Photo-induced deposition of low dielectric constant polyimide film for interlayer dielectric applications

Electronics Letters

Volumn 33, Issue 10, 1997, Pages 911-912

  Zhang, Jun Ying ^a   Boyd, I W ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

Dielectric thin films; Semiconductor devices

Indexed keywords

CURING; DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC VARIABLES MEASUREMENT; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAT TREATMENT; LEAKAGE CURRENTS; POLYIMIDES; SILICON WAFERS;

CAPACITANCE VOLTAGE MEASUREMENT; CURRENT VOLTAGE MEASUREMENT; IMIDIZATION; PHOTO INDUCED DEPOSITION; POLYIMIDE FILM;

THIN FILMS;

EID: 0031559341     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19970603     Document Type: Article

References (6)

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3. KOGELSCHATZ, U.: 'Silent discharges for the generation of ultraviolet and vacuum ultraviolet excimer radiation', Pure Appl. Chem., 1990, 62, pp. 1667-1674
4. KOGELSCHATZ, U.: 'Silent-discharge driven excimer UV sources and their applications', Appl. Surf. Sci., 1992, 54, pp. 410-423
5. ZHANG, J.-Y., and BOYD, I.W.: 'Efficient excimer ultraviolet source from a dielectric barrier discharge in rare-gas/halogen mixtures', J. Appl. Phys., 1996, 80, pp. 633-638
6. PRYDE, C.A.: 'IR studies of polyimides I. Effects of chemical and physical changes during cure', J. Polym. Sci.: Part A: Polym. Chem., 1989, 27, pp. 711-724