Nanotribological characterization of digital micromirror devices using an atomic force microscope

Ultramicroscopy

Volumn 100, Issue 3-4, 2004, Pages 391-412

  Liu, Huiwen ^a   Bhushan, Bharat ^a  

^a The Ohio State University   (United States)

Author keywords

07.79.Sp; 62.20.Mk; 85.70.Kh; Atomic force microscope (AFM); Digital light processing (DLP); Digital micromirror device (DMD); Friction; Self assembled monolayer (SAM); Stiction; Wear

Indexed keywords

ATMOSPHERIC HUMIDITY; ATOMIC FORCE MICROSCOPY; FRICTION; MICROPROCESSOR CHIPS; SILICON; STIFFNESS; TRIBOLOGY;

DIGITAL MICROMIRROR DEVICES (DMD); MEMORY CHIPS; POTENTIAL MECHANISMS;

DIGITAL DEVICES;

ANALYTICAL EQUIPMENT; ATOMIC FORCE MICROSCOPY; CONFERENCE PAPER; DIGITAL MICROMIRROR DEVICE; FRICTION; HUMIDITY; METHODOLOGY; MICROSCOPE; NANOTECHNOLOGY; RIGIDITY; SURFACE PROPERTY; TEMPERATURE;

EID: 3042607950     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2003.11.016     Document Type: Conference Paper

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