메뉴 건너뛰기




Volumn 10, Issue 4, 2004, Pages 269-271

A novel device of passive and fixed alignment of optical fiber

Author keywords

MOEMS; Optical fiber; Passive and fixed alignment; SU 8 photoresist; UV LIGA

Indexed keywords

ALIGNMENT; ASPECT RATIO; ETCHING; HEAT TREATMENT; MICROOPTICS; OPTICAL COMMUNICATION; PHOTORESISTS;

EID: 3042549209     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-002-0291-6     Document Type: Article
Times cited : (18)

References (15)
  • 1
    • 0033311877 scopus 로고    scopus 로고
    • Basic design for highly stable mechanical optical fiber splice and its development
    • Katagiri T; Tachikura M; Murakami Y (1999) Basic design for highly stable mechanical optical fiber splice and its development. J Lightwave Technology 17(11): 2297-2306
    • (1999) J Lightwave Technology , vol.17 , Issue.11 , pp. 2297-2306
    • Katagiri, T.1    Tachikura, M.2    Murakami, Y.3
  • 2
    • 0031095436 scopus 로고    scopus 로고
    • Bulk silicon holding structures for mounting of optical fibers in V-grooves
    • Strandman C; Bäklund Y (1997) Bulk silicon holding structures for mounting of optical fibers in V-grooves. J Microe Syst 6(1): 35-40
    • (1997) J Microe Syst , vol.6 , Issue.1 , pp. 35-40
    • Strandman, C.1    Bäklund, Y.2
  • 3
    • 0031236013 scopus 로고    scopus 로고
    • Vertical mirrors fabricated by deep reactive ion etching for fiber-optic switching applications
    • Marxer C; Thio C (1997) Vertical mirrors fabricated by deep reactive ion etching for fiber-optic switching applications. J Microe Syst 6(3): 277-285
    • (1997) J Microe Syst , vol.6 , Issue.3 , pp. 277-285
    • Marxer, C.1    Thio, C.2
  • 4
    • 0026225057 scopus 로고
    • LIGA-based flexible microstuctures for fiber-chip coupling
    • Rogner A; Ehrfeld W (1991) LIGA-based flexible microstuctures for fiber-chip coupling [J]. J Micromech Microeng 1(3): 167-170
    • (1991) J Micromech Microeng , vol.1 , Issue.3 , pp. 167-170
    • Rogner, A.1    Ehrfeld, W.2
  • 5
    • 0038798179 scopus 로고
    • Micromachining applications for a high resolution ultra-thick photoresist
    • Lee K; LaBianca N (1995) Micromachining applications for a high resolution ultra-thick photoresist. J Vac Scien Technol B 13: 3012-3016
    • (1995) J Vac Scien Technol B , vol.13 , pp. 3012-3016
    • Lee, K.1    Labianca, N.2
  • 7
    • 0030677606 scopus 로고    scopus 로고
    • High aspect ratio ultrathick, negative-tone near-UV photoresist for MEMS applications
    • IEEE, Nagoya
    • Despont M; Lorenz H; Fahrni N (1997) High aspect ratio ultrathick, negative-tone near-UV photoresist for MEMS applications. MEMS'97, pp. 518-522, IEEE, Nagoya
    • (1997) MEMS'97 , pp. 518-522
    • Despont, M.1    Lorenz, H.2    Fahrni, N.3
  • 9
    • 0030717908 scopus 로고    scopus 로고
    • Fabrication process of high aspect ratio elastic structures for piezoelectric motor applications
    • International Conference on Solid-state Sensors and Actuators, Chicago
    • Dellmann L; Roth S; Beuret C (1997) Fabrication process of high aspect ratio elastic structures for piezoelectric motor applications. Transducers 1997, pp. 641-644, International Conference on Solid-state Sensors and Actuators, Chicago
    • (1997) Transducers 1997 , pp. 641-644
    • Dellmann, L.1    Roth, S.2    Beuret, C.3
  • 10
    • 0030649160 scopus 로고    scopus 로고
    • Simple and low cost fabrication of embedded microchannels by using a new thick-film photoplastic
    • International Conference on Solid-state Sensors and Actuators, Chicago
    • Guerin L; Bissel M (1997) Simple and low cost fabrication of embedded microchannels by using a new thick-film photoplastic. Transducers 1997, pp. 1419-1422, International Conference on Solid-state Sensors and Actuators, Chicago
    • (1997) Transducers 1997 , pp. 1419-1422
    • Guerin, L.1    Bissel, M.2
  • 11
    • 0031677948 scopus 로고    scopus 로고
    • Taguchi Optimization for the processing Epon SU-8 resist
    • IEEE, Heidelberg
    • Eyre B; Blosiu J (1998) Taguchi Optimization for the processing Epon SU-8 resist. MEMS'98, pp. 218-222, IEEE, Heidelberg
    • (1998) MEMS'98 , pp. 218-222
    • Eyre, B.1    Blosiu, J.2
  • 12
    • 0000968175 scopus 로고    scopus 로고
    • Fabrication of photoplastic high-aspect ratio microparts and micromolds using SU-8 UV resist
    • Lorenz H; Despont M (1998) Fabrication of photoplastic high-aspect ratio microparts and micromolds using SU-8 UV resist. Microsyst Technol 4: 143-146
    • (1998) Microsyst Technol , vol.4 , pp. 143-146
    • Lorenz, H.1    Despont, M.2
  • 13
    • 0000210905 scopus 로고    scopus 로고
    • Two steps micromoulding and photopolymer high-aspect ratio structuring for applications in piezoelectric motor components
    • Dellmann L; Roth S; Beuret C (1998) Two steps micromoulding and photopolymer high-aspect ratio structuring for applications in piezoelectric motor components. Microsyst Technol 4: 147-150
    • (1998) Microsyst Technol , vol.4 , pp. 147-150
    • Dellmann, L.1    Roth, S.2    Beuret, C.3
  • 14
    • 0031685672 scopus 로고    scopus 로고
    • Mechanical characterization of a new high-aspect-ratio near UV-photoresist
    • Lorenz H; Laudon M (1998) Mechanical characterization of a new high-aspect-ratio near UV-photoresist. Microelec Engin 41/42: 371-374
    • (1998) Microelec Engin , vol.41-42 , pp. 371-374
    • Lorenz, H.1    Laudon, M.2
  • 15
    • 0032293165 scopus 로고    scopus 로고
    • Mask prototyping for ultra-deep X-ray lithography: Preliminary studies for mask blanks and high-aspect-ratio absorber patterns
    • SPIE, Santa Clara CA
    • Malek C (1998) Mask prototyping for ultra-deep X-ray lithography: preliminary studies for mask blanks and high-aspect-ratio absorber patterns. Micromachining and Microfabrication process Technology, vol.3512, pp. 277-285, SPIE, Santa Clara CA
    • (1998) Micromachining and Microfabrication Process Technology , vol.3512 , pp. 277-285
    • Malek, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.