Mask prototyping for ultra-deep X-ray lithography: Preliminary studies for mask blanks and high-aspect-ratio absorber patterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3512, Issue , 1998, Pages 277-285

  Malek, Chantal Khan ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COMPUTATIONAL METHODS; ELECTROMAGNETIC WAVE ABSORPTION; MASKS; PHOTORESISTS; ULTRAVIOLET RADIATION;

HIGH-ASPECT-RATIO ABSORBER PATTERNS; ULTRA-DEEP X RAY LITHOGRAPHY;

X RAY LITHOGRAPHY;

EID: 0032293165     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)