Two steps micromoulding and photopolymer high-aspect ratio structuring for applications in piezoelectric motor components

Microsystem Technologies

Volumn 4, Issue 3, 1998, Pages 147-150

  Dellmann, L ^a   Roth, S ^a   Beuret, C ^a   Paratte, L ^a   Racine, G A ^a   Lorenz, H ^b   Despont, M ^c   Renaud, P ^b   Vettiger, P ^c   De Rooij, N F ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

^b EPFL   (Switzerland)

^c IBM RESEARCH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000210905     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s005420050119     Document Type: Article

References (9)

1. Beuret C; Racine G-A; Gobet J; Luthier R; de Rooij NF: (1994) Microfabrication of 3D multidirectional inclined structures by UV lithography and electroplating; MEMS '94 Proceedings: 81-85
2. Dellmann L; Roth S; Beuret C; Racine G-A; Lorenz H; Despont M; Renaud P; Vettiger P; de Rooij NF: (1997) Fabrication process of high aspect ratio elastic structures for piezoelectric motor applications; Transducers 97
3. Despont M; Lorentz H; Fahrni N; Brugger J; Renaud P; Vettiger P: (1997) High aspect ratio, ultrathick, negative-tone near-UV photoresist for MEMS applications; MEMS '97 Proceedings: 518-522
4. Lee KY; LaBianca N; Rishton SA; Zolgharnain S; Gelorme JD; Shaw J; Chang THP: (1995) Micromachining applications of a high resolution ultrathick photoresist; J Vac Sci Technol B 13: 3012-3016
5. Lorenz H; Despont M; Fahrni N; LaBlanca N; Renaud P, Vettiger P: (1996) EPON SU-8: A low-cost negative resist for MEMS; MME '96 Proceedings: 32-35
6. Miyajima H; Furukawa S; Mehregany M: (1994) High aspect ratio photolithography with precise dimensional control; The Electrochemical Society Proceedings Volume 94-32: 63-74
7. Moreau M (1988) Semiconductor lithography principles, practices and materials; Plenum Press 1988; New York: 459-467 and 500-506
8. Racine G-A; Luthier R; de Rooij NF: (1993) Hybrid ultrasonic micromachined motors; MEMS '93 Proceedings: 128-132
9. Williams KR; Muller RS: (1996) Etch rates for micromachining processing; IEEE J. Microelectromech. Syst., Vol. 5, no 4: 256-269