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Thin Solid Films

Volumn 497, Issue 1-2, 2006, Pages 65-71

Growth and properties of amorphous thin films of the Al2O 3-Y2O3 system

(2) Kuo, D H a Chen, W R a

a NATIONAL DONG HWA UNIVERSITY (Taiwan)

Author keywords

Dielectric properties; Electrical properties and measurements; Oxides; Sputtering

Indexed keywords

ALUMINUM COMPOUNDS; AMORPHOUS MATERIALS; CERAMIC MATERIALS; DIELECTRIC PROPERTIES; ELECTRIC VARIABLES MEASUREMENT; GROWTH (MATERIALS); OXIDES; SPUTTERING;

COMPOSITE FILMS; ELECTRIC PROPERTIES AND MEASUREMENTS; FILM DEPOSITION; MOLAR RATIOS;

THIN FILMS;

EID: 30344484555 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2005.09.185 Document Type: Article

Times cited : (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.