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Volumn 21, Issue 6, 2003, Pages 1996-2002

Characterization of nonstoichiometric TiO2 and ZrO2 thin films stabilized by Al2O3 and SiO2 additions

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANNEALING; DIELECTRIC PROPERTIES; ELECTRIC PROPERTIES; ELECTRIC VARIABLES MEASUREMENT; MAGNETRON SPUTTERING; SILICA; STOICHIOMETRY; TEMPERATURE; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS; ZIRCONIA;

EID: 0842290152     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1622675     Document Type: Article
Times cited : (11)

References (31)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.