Characterization of nonstoichiometric TiO2 and ZrO2 thin films stabilized by Al2O3 and SiO2 additions

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 6, 2003, Pages 1996-2002

  Kuo, Dong Hau ^a   Tzeng, Kuo Hwa ^a   Chien, Chi Hung ^a  

^a NATIONAL DONG HWA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANNEALING; DIELECTRIC PROPERTIES; ELECTRIC PROPERTIES; ELECTRIC VARIABLES MEASUREMENT; MAGNETRON SPUTTERING; SILICA; STOICHIOMETRY; TEMPERATURE; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS; ZIRCONIA;

BREAKDOWN FIELD; DIELECTRIC LOSS TANGENT; ELECTRON SPECTROSCOPY FOR CHEMICAL ANALYSIS; ELECTRON TRANSFER;

THIN FILMS;

EID: 0842290152     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1622675     Document Type: Article

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