Physical properties and structure of rf-sputtered amorphous films in the system Al2O3-Y2O3

Journal of the American Ceramic Society

Volumn 85, Issue 4, 2002, Pages 915-920

  Fukuda, Kentaro ^a   Hanada, Teiichi ^a   Tanabe, Setsuhisa ^a   Yao, Takeshi ^a,b,c  

^a KYOTO UNIVERSITY   (Japan)

^b AMERICAN CERAMIC SOCIETY   (United States)

^c Graduate School of Energy Science Studies   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; COMPOSITION EFFECTS; ELASTICITY; EMISSION SPECTROSCOPY; POSITIVE IONS; REFRACTIVE INDEX; SPUTTERING; X RAY ANALYSIS;

ELASTIC CONSTANTS;

AMORPHOUS FILMS;

EID: 0036544988     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2002.tb00192.x     Document Type: Article

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