Study of Cu diffusion in porous dielectrics using secondary-ion-mass spectrometry

Journal of Applied Physics

Volumn 98, Issue 12, 2005, Pages

  Rodriguez, Oscar R ^a   Gill, William N ^a   Plawsky, Joel L ^a   Tsui, Ting Y ^b   Grunow, Stephan ^b  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROXYL SPECIES; ION DRIFT; MOLECULAR DIFFUSION; POROUS FILMS;

CHEMICAL REACTIONS; COPPER; DEGASSING; DIELECTRIC MATERIALS; POROUS MATERIALS; SECONDARY ION MASS SPECTROMETRY; SILICA;

DIFFUSION IN SOLIDS;

EID: 29744448345     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2149501     Document Type: Review

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