Growth and nanoscale ferroelectric investigation of radiofrequency- sputtered LiNbO3 thin films

Materials Chemistry and Physics

Volumn 86, Issue 2-3, 2004, Pages 340-346

  Bornand, V ^a   Gautier, B ^b   Papet, Ph ^a  

^a UNIVERSITÉ DE MONTPELLIER   (France)

^b INSTITUT DES NANOTECHNOLOGIES DE LYON   (France)

Author keywords

Atomic force microscopy; Ferroelectric; LiNbO3; Lithium niobate; Piezoresponse imaging; Thin films; X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; FERROELECTRIC MATERIALS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTOR GROWTH; SILICA; SPUTTERING; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

LINBO3; MACROSCOPIC CHARACTERIZATIONS; NANOMETRIC SCALE; PIEZORESPONSE IMAGING;

LITHIUM NIOBATE;

EID: 2942754014     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2004.03.018     Document Type: Article

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