Cat-CVD (hot-wire CVD): How different from PECVD in preparing amorphous silicon

Journal of Non-Crystalline Solids

Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 19-26

  Matsumura, Hideki ^a   Umemoto, Hironobu ^a   Masuda, Atsushi ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; OPTIMIZATION; PHASE DIAGRAMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPECTROSCOPY; THIN FILMS;

CATALYTIC REACTION; DEPOSITION PARAMETERS; SUBSTRATE TEMPERATURE;

SILICON;

EID: 2942556983     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.02.014     Document Type: Conference Paper

References (42)

1. S. Yamazaki, Japanese Patent 686,435, Appl. No. S43-41742 in 1968.
2. Yamazaki S., Wada K., Taniguchi I. Jpn. J. Appl. Phys. 9:1970;1467.
3. Wiesmann H., Ghosh A.K., McMahon T., Strongin M. J. Appl. Phys. 50:1979;3752.
4. H. Wiesmann, US Patent 4,237,150, Appl. No. 30,974 in 1979.
5. H. Matsumura, H. Ihara, H. Tachibana, Proc. 18th IEEE Photovoltaic Specialists Conf., Las Vegas, 1985, p. 1277.
6. Matsumura H., Tachibana H. Appl. Phys. Lett. 47:1985;833.
7. Matsumura H. Jpn. J. Appl. Phys. 25:1986;L949.
8. Matsumura H. Appl. Phys. Lett. 51:1987;804.
9. Matsumura H. J. Appl. Phys. 66:1989;3612.
10. Matsumura H. Jpn. J. Appl. Phys. 30:1991;L1522.
11. Doyle J., Robertson R., Lin G.H., He M.Z., Gallagher A. J. Appl. Phys. 64:1988;3215.
12. Dupuie J.L., Gulari E. Appl. Phys. Lett. 59:1991;549.
13. Dupuie J.L., Gulari E., Terry F. J. Electrochem. Soc. 139:1992;1151.
14. Deshpande S.V., Dupuie J.L., Gulari E. Appl. Phys. Lett. 61:1992;1420.
15. Mahan A.H., Carapella J., Nelson B.P., Crandall R.S., Balberg I. J. Appl. Phys. 69:1991;6728.
16. Schroeder B. Thin Solid Films. 430:2003;1.
17. H. Matsumura, K. Mimura, H. Makino, Dig. Tech. Papers 1995 Int. Workshop Active-Matrix Liquid-Crystal Displays, Osaka, 1995, p. 89.
18. Meiling H., Schropp R.E.I. Appl. Phys. Lett. 69:1996;1062.
19. Rath J.K., Tichelaar F.D., Meiling H., Schropp R.E.I. Mater. Res. Soc. Symp. Proc. 507:1998;879.
20. Sakai M., Tsutsumi T., Yoshioka T., Masuda A., Matsumura H. Thin Solid Films. 395:2001;330.
21. Honda N., Masuda A., Matsumura H. J. Non-Cryst. Solids. 266-269:2000;100.
22. Horbach C., Beyer W., Wagner H. J. Non-Cryst. Solids. 114:1989;187.
23. Nelson B.P., Xu Y., Mahan A.H., Williamson D.L., Crandall R.S. Mater. Res. Soc. Symp. Proc. 609:2000;A22.8.1.
24. Sault A.G., Goodman D.W. Surf. Sci. 235:1990;28.
25. S. Bauer, W. Herbst, B. Schroeder, H. Oechsner, W. Frammelsberger, H. Schade, Proc. 14th European Photovoltaic Solar Energy Conf., Barcelona, 1997, p. 617.
26. Lau K.K.S., Lewis H.G.P., Limb S.J., Kwan M.C., Gleason K.K. Thin Solid Films. 395:2001;288.
27. Nozaki Y., Kongo K., Miyazaki T., Kitazoe M., Horii K., Umemoto H., Masuda A., Matsumura H. J. Appl. Phys. 88:2000;5437.
28. Nozaki Y., Kitazoe M., Horii K., Umemoto H., Masuda A., Matsumura H. Thin Solid Films. 395:2001;47.
29. Umemoto H., Ohara K., Morita D., Nozaki Y., Masuda A., Matsumura H. J. Appl. Phys. 91:2002;1650.
30. Umemoto H., Nozaki Y., Kitazoe M., Horii K., Ohara K., Morita D., Uchida K., Ishibashi Y., Komoda M., Kamesaki K., Izumi A., Masuda A., Matsumura H. J. Non-Cryst. Solids. 299-302:2002;9.
31. Karasawa M., Masuda A., Ishibashi K., Matsumura H. Thin Solid Films. 395:2001;71.
32. A. Heya, A. Masuda, H. Matsumura, Tech. Dig. 11th Int. Photovoltaic Science and Engineering Conf., Sapporo, 1999, p. 781.
33. Nelson B.P., Iwaniczko E., Mahan A.H., Wang Q., Xu Y., Crandall R.S., Branz H.M. Thin Solid Films. 395:2001;292.
34. Ganguly G., Matsuda A. Phys. Rev. B. 47:1993;3661.
35. A. Masuda, M. Sakai, T. Tsutsumi, T. Yonezawa, H. Matsumura, Dig. Tech. Papers 2001 Int. Workshop Active-Matrix Liquid-Crystal Displays - TFT Technologies and Related Materials, Tokyo, 2001, p. 147.
36. M. Karasawa, M. Sakai, K. Ishibashi, M. Tanaka, A. Masuda, H. Matsumura, Proc. 21st Int. Display Research Conf. in Conjunction with 8th Int. Display Workshops, Nagoya, 2001, p. 1735.
37. R. Hattori, G. Nakamura, S. Nomura, T. Ichise, A. Masuda, H. Matsumura, Tech. Dig. 19th IEEE Gallium Arsenide Integrated Circuit Symp., Anaheim, 1997, p. 78.
38. Izumi A., Matsumura H. Jpn. J. Appl. Phys. 41:2002;4639.
39. Izumi A., Matsumura H. Appl. Phys. Lett. 71:1997;1371.
40. Izumi A., Masuda A., Matsumura H. Thin Solid Films. 343&344:1999;528.
41. Wang Q., Iwaniczko E., Xu Y., Nelson B.P., Mahan A.H. Mater. Res. Soc. Symp. Proc. 557:1999;163.
42. T. Tsujimura, Y. Kobayashi, K. Murayama, A. Tanaka, M. Morooka, E. Fukumoto, H. Fujimoto, J. Sekine, K. Kanoh, K. Takeda, K. Miwa, M. Asano, N. Ikeda, S. Kohara, S. Ono, C.-T. Chung, R.-M. Chen, J.-W. Chung, C.-W. Huang, H.-R. Guo, C.-C. Yang, C.-C. Hsu, H.-J. Huang, W. Riess, H. Riel, S. Karg, T. Beierlein, D. Gundlach, S. Alvarado, C. Rost, P. Mueller, F. Libsch, M. Mastro, R. Polastre, A. Lien, J. Sanford, R. Kaufman, Dig. Tech. Papers Soc. for Information Display 2003 Int. Symp., Vol. XXXIV, Baltimore, MD, 2003, p. 6.