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Volumn 557, Issue , 1999, Pages 163-168

Assessment of intrinsic-layer growth temperature to high-deposition-rate a-Si:H n-i-p solar cells deposited by hot-wire CVD

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; DIFFUSION IN SOLIDS; ELECTRONIC PROPERTIES; SOLAR CELLS; STRUCTURE (COMPOSITION); SUBSTRATES;

EID: 0033299967     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-557-163     Document Type: Article
Times cited : (18)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.