Characteristics of silicon nitride thin films prepared by using alternating exposures of SiH 2Cl 2 and NH 3

Journal of the Korean Physical Society

Volumn 47, Issue SUPPL. 3, 2005, Pages

  Lee, Won Jun ^a   Kim, Un Jung ^a   Han, Chang Hee ^b   Chun, Min Ho ^b   Rha, Sa Kyun ^b   Lee, Youn Seoung ^b  

^a Sejong University   (South Korea)

^b Hanbat National University   (South Korea)

Author keywords

Atomic layer deposition; Deposition rate; Leakage current; NH 3; SiH 2Cl 2; Silicon nitride; X ray photoelectron spectroscopy

Indexed keywords

EID: 29344441527     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (15)

1. M. Pessa, R. Makela and T. Suntola, Appl. Phys. Lett. 38, 131 (1981).
2. J. W. Klaus, O. Sneh and S. M. George, Science 278, 1934 (1997).
3. M. Ritala, M. Leskela, J.-P. Dekker, C. Mutsaers, P. J. Soininen and J. Skarp, Chem. Vap. Deposition 5, 7 (1999).
4. M. Ritala, K. Kukli, A. Rahtu, P. I. Raisanen, M. Leskela, T. Sajavaara and J. Keinonen, Science 288, 319 (2000).
5. H. K. Kim, J. Y. Kim, J. Y. Park, Y. Kim, Y. D. Kim and H. Jeon, J. Korean Phys. Soc. 41, 739 (2002).
6. T. Lee, J. Ahn, J. Oh, Y. Kim, Y.-B. Kim and D.-K. Choi, J. Korean Phys. Soc. 42, 272 (2003).
7. J. D. Plummer, M. D. Deal and P. B. Griffin, Silicon VLSI Technology (Prentice Hall, Upper Saddle River, New Jersey, 2000), Chap. 2.
8. A. Nakajima, Q. D. M. Khosru, T. Yoshimoto, T. Kidera and S. Yokoyama, Appl. Phys. Lett. 80, 1252 (2002).
9. G.-W. Lee, J.-H. Lee, J.-H. Choi, J.-C. Om, G.-S. Cho, J.-G. Jeong, G.-H. Yoon and S.-W. Park, J. Korean Phys. Soc. 44, 93 (2004).
10. S.-S. Lee, D.-G. Hwang, K. Rhie and S.-W. Kim, J. Korean Phys. Soc. 41, 749 (2002).
11. H. Goto, K. Shibahara and S. Yokoyama, Appl. Phys. Lett. 68, 3257 (1996).
12. S. Morishita, S. Sugahara and M. Matsumura, Appl. Surf. Sci. 112, 198 (1997).
13. J. W. Klaus, A. W. Ott, A. C. Dillon and S. M. George, Surf. Sci. 418, L14 (1998).
14. W.-J. Lee, J.-H. Lee, C. O. Park, Y.-S. Lee, S.-J. Shin and S.-K. Rha, J. Korean Phys. Soc. 45, 1352 (2004).
15. X. Hong, Introduction to Semiconductor Manufacturing Technology (Prentice Hall, Upper Saddle River, New Jersey, 2001), p. 394.