Reduction of Hydrogen-Induced Degradation by Using a Phosphorus-Implantation Process

Journal of the Korean Physical Society

Volumn 44, Issue 1, 2004, Pages 93-96

  Lee, Ga Won ^a   Lee, Jae Hee ^a   Choi, Jae Hoon ^a   Om, Jae Chul ^a   Cho, Gyu Seog ^a   Jeong, Jae Goan ^a   Yoon, Gyu Han ^a   Park, Seong Wook ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

Boron hydrogen bond; Hump; Hydrogen; Phosphorus implant

Indexed keywords

EID: 0842328993     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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