Plasma diagnostics in large area plasma processing system

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1367-1373

  Leonhardt, D ^a   Walton, S G ^a   Blackwell, D D ^a   Amatucci, W E ^a   Murphy, D P ^a   Fernsler, R F ^a   Meger, R A ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTRON BEAMS; IONIZATION; MASS SPECTROMETRY; MICROWAVE POWER TRANSMISSION; PLASMA COLLISION PROCESSES; PLASMA DENSITY; PLASMA PROBES; SENSORS; VACUUM APPLICATIONS;

CURRENT SENSORS; INSULATED VACUUM CHAMBERS;

PLASMA DIAGNOSTICS;

EID: 0035393964     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1359554     Document Type: Article

References (17)