Inductively coupled plasma assisted physical vapor deposition of titanium nitride coatings

Journal of Electronic Materials

Volumn 26, Issue 11, 1997, Pages 1297-1302

  Meng, W J ^a   Curtis, T J ^a,b  

^a GENERAL MOTORS CORPORATION   (United States)

^b Entech Engineering   (United States)

Author keywords

Ceramic thin films; Inductively coupled plasma (ICP); Ion energy; Magnetron sputtering; Physical vapor deposition; TiN coating

Indexed keywords

EID: 0001116463     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-997-0074-z     Document Type: Article

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