Implementing AAPSM in 90 nm product with practical image imbalance correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 103-111

  Lin, Benjamin ^a   Hsu, Shu Hao ^a   Huang, I H ^a   Chen, Kunyuan ^b   Hsieh, Frank ^b   Hsu, Tony ^b   Liu, Hua Yu ^c   Kroyan, Armen ^c   Hsu, Freeman ^c   Huang, Jason ^c  

^a UNITED MICROELECTRONICS CORPORATION   (Taiwan)

^b Toppan Chunghwa Electronics Co Ltd   (Taiwan)

^c SYNOPSYS INC   (United States)

Author keywords

Alternating aperture PSM; DOF; Image intensity imbalance; Shifter Width bias; SRAM; Undercut

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROMAGNETIC WAVE TRANSMISSION; ERROR ANALYSIS; ETCHING; IMAGING TECHNIQUES; LIGHT SCATTERING; MASKS; PHASE SHIFT; QUARTZ; SCANNING ELECTRON MICROSCOPY;

ALTERNATING-APERTURE PSM; IMAGE INTENSITY IMBALANCE; PHASE SHIFT MASKS (PSM); SHIFTER; UNDERCUT; WIDTH BIAS;

PHOTOLITHOGRAPHY;

EID: 11144356977     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518029     Document Type: Conference Paper

References (8)

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8. J. Lin and F. Hsieh "Practical approach for AAPSM image imbalance correction for sub-100 nm lithography" Proc. SPIE, Vol 5130, p. 778, 2003