Droplet laser plasma source for EUV lithography

Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest

Volumn , Issue , 2000, Pages 393-394

  Schriever, G ^a   Richardson, M ^a   Turcu, E ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DOSIMETRY; LIGHT EMISSION; LIGHT REFLECTION; MIRRORS; NEODYMIUM LASERS; OPTICAL MULTILAYERS; PHOTOLITHOGRAPHY; Q SWITCHED LASERS; ULTRAVIOLET RADIATION;

DROPLET LASER PLASMA SOURCE; EXTREME ULTRAVIOLET LITHOGRAPHY; MULTILAYER MIRRORS; PLASMA EMISSION;

LASER PRODUCED PLASMAS;

EID: 0034547024     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/cleo.2000.907165     Document Type: Article

References (9)