Preparation and characterization of Pt/MgO/Si multilayer thin films

Journal of Crystal Growth

Volumn 194, Issue 1, 1998, Pages 89-93

  Cheng, Jiangong ^a   Meng, Xiangjian ^a   Yang, Pingxong ^a   Chu, Junhao ^a  

^a SHANGHAI INSTITUTE OF TECHNICAL PHYSICS   (China)

Author keywords

AP MOCVD; Crystal orientation; DC sputtering; Pt MgO Si multilayer thin films

Indexed keywords

ANNEALING; CRYSTAL ORIENTATION; FILM PREPARATION; INTERDIFFUSION (SOLIDS); INTERFACES (MATERIALS); MAGNESIA; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLATINUM; SILICON; SINGLE CRYSTALS; SPUTTER DEPOSITION; THIN FILMS;

ATMOSPHERIC PRESSURE METALLORGANIC CHEMICAL VAPOR DEPOSITION;

MULTILAYERS;

EID: 0032206910     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(98)00613-7     Document Type: Article

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