Ion beam-assisted deposition of magnesium oxide thin film for PDP applications

Surface and Coatings Technology

Volumn 163-164, Issue , 2003, Pages 728-733

  Ide Ektessabi, Ari ^a   Nomura, Hiroshi ^a   Yasui, Nobuto ^a   Tsukuda, Y Yuji ^b  

^a KYOTO UNIVERSITY   (Japan)

^b Sanwa Kenma Ltd   (Japan)

Author keywords

Ion beam deposition; Oxides; Plasma display panel; Rutherford backscattering spectroscopy; X Ray diffraction

Indexed keywords

ION BEAM ASSISTED DEPOSITION; ION BEAMS; IRRADIATION; MAGNESIA; RUTHERFORD BACKSCATTERING SPECTROSCOPY; X RAY DIFFRACTION;

PLASMA PANEL DISPLAY;

THIN FILMS;

DEPOSITION; INORGANIC COATING; ION; MAGNESIUM OXIDE; PLASMA;

EID: 0037472589     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00695-3     Document Type: Article

References (14)

1. S.J. Rho, S.M. Jeong, H.K. Baik, K.M. Song, Thin Solid Films 355/356 (1999) 55.
2. T. Urade, T. Iemori, M. Osawa, N. Nakayama, I. Morita, IEEE Trans. Electron Devices 23 (1976) 313.
3. H. Uchiike, K. Miura, N. Nakayama, T. Shinoda, Y. Fukushima, IEEE Trans. Electron Devices 23 (1976) 1211.
4. K. Yoshida, H. Uchiike, M. Sawa, IEICE Trans. Electron. E82- C (1999) 1798.
5. E.H. Choi, H.J. Oh, Y.G. Kim, J.J. Ko, J.Y. Lim, J.G. Kim, D.I. Kim, G. Cho, S.O. Kang, Jpn. J. Appl. Phys. 37 (1998) 7015.
6. P.J. Martin, Mater J. Sci. 21 (1986) 1.
7. D. Van Vechten, G.K. Hubler, E.P. Donovan, F.D. Correll, J. Vac. Sci. Technol. A 8 (1990) 821.
8. A.M. Ektessabi, S. Sato, H. Kitamura, Y. Masaki, Vacuum 44 (1993) 213.
9. W. Ensinger, Rev. Sci. Instrum. 63 (1992) 5217.
10. G.K. Hubler, D. Van Vechten, E.P. Donovan, C.A. Carosella, J. Vac. Sci. Technol. A 8 (1990) 831.
11. F.A Smidt, Int. Mater. Rev. 35 (1990) 61.
12. J.K. Hirvonen, Mater. Sci. Rep. 6 (1991) 215.
13. A.M. Ektessabi, Nucl. Instrum. Methods Phys. Res. B 99 (1995) 610.
14. L.C. Feldman, J.W. Mayer, Fundamentals of Surface and Thin Film Analysis, Elsevier/North-Holland, Amsterdam, 1986, pp. 39-55.