Quartz micromachining using laser plasma soft x rays and ultraviolet laser light

Applied Physics Letters

Volumn 85, Issue 7, 2004, Pages 1274-1276

  Makimura, Tetsuya ^a   Mitani, Shinjo ^a   Kenmotsu, Youichi ^a   Murakami, Kouichi ^a   Mori, Michiaki ^b   Kondo, Kiminori ^c  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTRUM; LASER PLASMAS; QUARTZ MICROMACHINING; ULTRAVIOLET LASER LIGHTS;

ABSORPTION; DIFFRACTION GRATINGS; DNA; ION BEAM LITHOGRAPHY; LASER BEAM EFFECTS; OPTICAL MICROSCOPY; PROTEINS; QUARTZ; SILICA; SPECTRUM ANALYSIS; THERMAL EFFECTS; ULTRAVIOLET RADIATION; X RAY ANALYSIS;

MICROMACHINING;

EID: 4444349161     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1782265     Document Type: Article

References (26)

1. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Science 272, 85 (1996).
2. S. Y. Chou, C. Keimel, and J. Gu, Nature (London) 417, 835 (2002).
3. J. Han, S. W. Turner, and H. G. Craighead, Phys. Rev. Lett. 83, 1688 (1999).
4. N. Kaji, Y. Tezuka, Y. Takamura, M. Ueda, T. Nishimoto, H. Nakanishi, Y. Horiike, and Y. Baba, Anal. Chem. 76, 15 (2004).
5. D. M. Tennant, T. L. Koch, P. P. Mulgrew, R. P. Gnall, F. Ostermeyer, and J.-M. Verdiell, J. Vac. Sci. Technol. B 10, 2530 (1992).
6. C. Dix, P. F. McKee, A. R. Thurlow, J. R. Towers, and D. C. Wood, J. Vac. Sci. Technol. B 12, 3708 (1994).
7. D. R. Allee, C. P. Umbach, and A. N. Broers, J. Vac. Sci. Technol. B 9, 2838 (1991).
8. D. Winkler, H. Zimmermann, M. Mangerich, and R. Trauner, Microelectron. Eng. 31, 141 (1996).
9. I Benninon, D. C. J. Reid, C. J. Rowe, and W. J. Steward, Electron. Lett. 22, 341 (1986).
10. J. Albert, K. O. Hill, B. Malo, D. C. Johnson, F. Bilodeau, I. M. Templeton, and J. L. Brebner, Appl. Phys. Lett. 63, 2309 (1993).
11. K Sugioka, S. Wada, H. Tashiro, K. Toyoda, Y. Ohnuma, and A. Nakamura, Appl. Phys. Lett. 67, 2789 (1995).
12. J. Zhang, K. Sugioka, T. Takahashi, K. Toyoda, and K. Midorikawa, Appl. Phys. A: Mater. Sci. Process. 71, 23 (2000).
13. J. Zhang, K. Sugioka, and K. Midorikawa, Opt. Lett. 23, 1486 (1998).
14. J. Wang, H. Niino, and A. Yabe, Appl. Phys. A: Mater. Sci. Process. 68, 111 (1999).
15. J. Wang, H. Niino, and A. Yabe, Appl. Phys. A: Mater. Sci. Process. 69, S271 (1999).
16. J. Ihremann, B. Wolf, and P. Simon, Appl. Phys. A: Solids Surf. 54, 363 (1992).
17. P. R. Herman, R. S. Marjoribanks, A. Oettl, K. Chen, I. Konovalov, and S. Ness, Appl. Surf. Sci. 154-155, 577 (2000).
18. H. Varel, D. Ashkenasi, A. Rosenfeld, M. Wahmer, and E. E. B. Campbell, Appl. Phys. A: Mater. Sci. Process. 65, 367 (1997).
19. K. Kawamura, N. Sarukura, M. Hirano, and H. Hosono, Jpn. J. Appl. Phys., Part 2 39, L767 (2000).
20. K. Murakami, H. C. Gerritsen, H. van Brug, F. Bijkerk, F. W. Saris, and M. J. van der Wiel, Phys. Rev. Lett. 56, 655 (1986).
21. T. Makimura, T. Sakuramoto, and K. Murakami, Jpn. J. Appl. Phys., Part 2 35, L735 (1996).
22. Y. Toyozawa, Excitonic Processes in Solids, Vol. 60 (Springer, Berlin, 1986), Springer Series in Solid-State Sciences, Chap. 4.
23. K. S. Song and R. T. Williams, Self-Trapped Excitons, Solid-State Sciences, Vol. 105 (Springer, Berlin, 1993).
24. R. T. Williams and M. N. Kabler, Phys. Rev. B 9, 1897 (1974).
25. C. Itoh, K. Tanimura, and N. Itoh, J. Phys. C 21, 4693 (1988).
26. C. Itoh, T. Suzuki, and N. Itoh, Phys. Rev. B 41, 3794 (1990).