Ignition and dynamics of high-voltage glow discharge plasma implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 242, Issue 1-2, 2006, Pages 275-278

  Fu, Ricky K Y ^a   Chu, Paul K ^a   Tian, X B ^b   Yang, S Q ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

High voltage glow discharge; Plasma diagnostic; Plasma immersion ion implantation and deposition

Indexed keywords

ANODES; CATHODES; ELECTRIC POTENTIAL; GLOW DISCHARGES; IGNITION; ION IMPLANTATION;

GLOW DISCHARGE PLASMA; HIGH-VOLTAGE PLASMA; PLASMA IMMERSION; SELF-IGNITION;

PLASMA DENSITY;

EID: 28544440390     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.08.033     Document Type: Conference Paper

References (18)

1. H. Shinno, K. Ishioka, and M. Kitajima Vacuum 66 2002 335
2. J.R. Conrad, J.L. Radtke, R.A. Dodd, F.J. Worala, and N.C. Tran J. Appl. Phys. 62 1987 4591
3. P.K. Chu, S. Qin, C. Chan, N.W. Cheung, and L.A. Larson Mater. Sci. Eng. Rep. 17 1996 207
4. A. Anders Handbook of Plasma Immersion Ion Implantation and Deposition 2000 Wiley New York
5. H.H. Tong, R.K.Y. Fu, X.C. Zeng, and P.K. Chu J. Appl. Phys. 92 2002 2284
6. R.K.Y. Fu, P.K. Chu, and X.B. Tian J. Appl. Phys. 95 2004 3319
7. J.N. Matossian, and R. Wei Surf. Coat. Technol. 85 1996 92
8. V.I. Khvesyuk, and P.A. Tsygankov Surf. Coat. Technol. 96 1997 68
9. Y. Nishimura, A. Chayahara, Y. Horino, and M. Yatsuzuka Surf. Coat. Technol. 156 2002 50
10. X.B. Tian, R.K.Y. Fu, D.T.K. Kwok, and P.K. Chu Surf. Coat. Technol. 169 2003 36
11. X.B. Tian, P. Peng, and P.K. Chu Phys. Lett. A 303 2002 67
12. W. Lochte-Holtgreven Plasma Diagnostics 1995 AIP New York
13. P.K. Chu, B.Y. Tang, Y.C. Cheng, and P.K. Ko Rev. Sci. Instr. 68 4 1997 1866
14. M.A. Lieberman, and A.J. Lichtenberg Principles of Plasma Discharges and Materials Processing 1994 Wiley New York
15. X.B. Tian, and P.K. Chu Rev. Sci. Instr. 71 2000 2839
16. D.L. Tang, R.K.Y. Fu, X.B. Tian, and P.K. Chu Rev. Sci. Instr. 74 2003 2704
17. X.B. Tian, and P.K. Chu J. Phys. D: Appl. 34 2001 354
18. H. Hillmann, F. Muller, and H. Wenz Plasma Sources Sci. Technol. 3 1994 496