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Volumn 34, Issue 3, 2001, Pages 354-359

Experimental investigation of the electrical characteristics and initiation dynamics of pulsed high-voltage glow discharge

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ION IMPLANTATION; NITRIDING; PLASMA APPLICATIONS;

EID: 0034825826     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/34/3/318     Document Type: Article
Times cited : (27)

References (26)
  • 6
    • 0342329816 scopus 로고    scopus 로고
    • Time resolved measurements of pulsed discharge: The role of metastable atoms in the afterglow
    • ed U Kortshagen and L D Tsendin (New York: Plenum)
    • Overzet L J and Kleber J 1998 Time resolved measurements of pulsed discharge: the role of metastable atoms in the afterglow Electron Kinetics and Applications of Glow Discharges ed U Kortshagen and L D Tsendin (New York: Plenum) p 511
    • (1998) Electron Kinetics and Applications of Glow Discharges , pp. 511
    • Overzet, L.J.1    Kleber, J.2
  • 12
    • 33847576321 scopus 로고
    • High impedance plasma ion implantation method and apparatus US Patent Specification 5300800
    • Schumacher R W, Matossian J N and Goebel D M 1994 High impedance plasma ion implantation method and apparatus US Patent Specification 5300800
    • (1994)
    • Schumacher, R.W.1    Matossian, J.N.2    Goebel, D.M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.