SCOPUS 정보 검색 플랫폼

Physics Letters, Section A: General, Atomic and Solid State Physics

Volumn 303, Issue 1, 2002, Pages 67-71

Enhancement of process efficacy using seed plasma in pulsed high-voltage glow-discharge plasma implantation

(3) Tian, X B a Peng, P a Chu, Paul K a

a CITY UNIVERSITY OF HONG KONG (Hong Kong)

Author keywords

Glow discharge; Ion gauge; Plasma

Indexed keywords

GAGES; PLASMA THEORY; PLASMAS;

APPLIED VOLTAGES; DISCHARGE CHARACTERISTICS; ION GAUGES; IONIZATION GAUGE; PULSED HIGH VOLTAGE; SURFACE MODIFICATION TECHNIQUES; VACUUM MEASUREMENTS; WORKING PRESSURES;

GLOW DISCHARGES;

ION;

ARTICLE; ELECTRIC POTENTIAL; ELECTRICITY; IONIZATION; PHYSICS; PRESSURE; TECHNIQUE; VACUUM;

EID: 1342275878 PISSN: 03759601 EISSN: None Source Type: Journal
DOI: 10.1016/S0375-9601(02)01234-3 Document Type: Article

Times cited : (13)

References (16)

1
- 0004249889
- Wiley
- H. Ryssel, I. Ruge, Ion Implantation, Wiley, 1986.
- (1986) Ion Implantation
- Ryssel, H.¹ Ruge, I.²

2
- 0010985874
- North-Holland
- J.F. Ziegler, Ion Implantation Technology, North-Holland, 1992.
- (1992) Ion Implantation Technology
- Ziegler, J.F.¹

3
- 0042633781
- J.R. Conrad, J.I. Radke, R.A. Dodd, F.J. Warzala, N.C. Tran, J. Appl. Phys. 62 (1987) 4591.
- (1987) J. Appl. Phys. , vol.62 , pp. 4591
- Conrad, J.R.¹ Radke, J.I.² Dodd, R.A.³ Warzala, F.J.⁴ Tran, N.C.⁵

4
- 0004215110
- Wiley, New York
- A. Anders, Handbook of Plasma Immersion Ion Implantation and Deposition, Wiley, New York, 2000.
- (2000) Handbook of Plasma Immersion Ion Implantation and Deposition
- Anders, A.¹

5
- 0001513339
- M.M. Shamim, K. Sridhoron, R.P. Fetherston, A. Chen, J.R. Conrad, J. Vac. Sci. Technol. B 12 (1994) 843.
- (1994) J. Vac. Sci. Technol. B , vol.12 , pp. 843
- Shamim, M.M.¹ Sridhoron, K.² Fetherston, R.P.³ Chen, A.⁴ Conrad, J.R.⁵

6
- 0342748696
- U. Homauer, R. Gunzel, H. Reuther, E. Richter, E. Wieser, W. Moller, G. Schumacher, F. Dettenwanger, M. Schutze, Surf. Coat. Technol. 125 (2000) 89.
- (2000) Surf. Coat. Technol. , vol.125 , pp. 89
- Homauer, U.¹ Gunzel, R.² Reuther, H.³ Richter, E.⁴ Wieser, E.⁵ Moller, W.⁶ Schumacher, G.⁷ Dettenwanger, F.⁸ Schutze, M.⁹

7
- 0011060440
- Garmisch-P, September 17-21
- U. Hornauer, R. Gunzel, E. Richter, E. Wieser, W. Moller, G. Schumacher, F. Dettenwanger, M. Schutze, in: Proceedings of 7th International Conference on Plasma Science Engineering, Garmisch-P, September 17-21, 2000.
- (2000) Proceedings of 7th International Conference on Plasma Science Engineering
- Hornauer, U.¹ Gunzel, R.² Richter, E.³ Wieser, E.⁴ Moller, W.⁵ Schumacher, G.⁶ Dettenwanger, F.⁷ Schutze, M.⁸

8
- 0031364825
- E. Guiberteau, G. Bonhomme, R. Hugon, G. Henrion, Surf. Coat. Technol. 97 (1997) 552.
- (1997) Surf. Coat. Technol. , vol.97 , pp. 552
- Guiberteau, E.¹ Bonhomme, G.² Hugon, R.³ Henrion, G.⁴

9
- 0033496104
- T.A. Beer, J. Laimer, H. Stori, Surf. Coat. Technol. 121 (1999) 331.
- (1999) Surf. Coat. Technol. , vol.121 , pp. 331
- Beer, T.A.¹ Laimer, J.² Stori, H.³

10
- 0030296206
- J.N. Mattossian, R. Wei, Surf. Coat. Technol. 85 (1996) 92.
- (1996) Surf. Coat. Technol. , vol.85 , pp. 92
- Mattossian, J.N.¹ Wei, R.²

11
- 0031551643
- V.I. Khvesyuk, P.A. Tsygankov, Surf. Coat. Technol. 96 (1997) 68.
- (1997) Surf. Coat. Technol. , vol.96 , pp. 68
- Khvesyuk, V.I.¹ Tsygankov, P.A.²

12
- 0034825826
- X.B. Tian, P.K. Chu, J. Phys. D 34 (2001) 354.
- (2001) J. Phys. D , vol.34 , pp. 354
- Tian, X.B.¹ Chu, P.K.²

13
- 0000968807
- P.K. Chu, B.Y. Tang, Y.C. Cheng, P.K. Ko, Rev. Sci. Instrum. 68 (1997) 1866.
- (1997) Rev. Sci. Instrum. , vol.68 , pp. 1866
- Chu, P.K.¹ Tang, B.Y.² Cheng, Y.C.³ Ko, P.K.⁴

14
- 0000383221
- X.B. Tian, B.Y. Tang, P.K. Chu, J. Appl. Phys. 86 (1999) 3567.
- (1999) J. Appl. Phys. , vol.86 , pp. 3567
- Tian, X.B.¹ Tang, B.Y.² Chu, P.K.³

15
- 0011022760
- H. Hillmann, F. Muller, H. Wenz, Plasma Source Sci. Technol. 3 (1994) 496.
- (1994) Plasma Source Sci. Technol. , vol.3 , pp. 496
- Hillmann, H.¹ Muller, F.² Wenz, H.³

16
- 0035363368
- X.B. Tian, X.C. Zeng, P.K. Chu, IEEE Trans. Plasma Sci. 29 (2001) 529.
- (2001) IEEE Trans. Plasma Sci. , vol.29 , pp. 529
- Tian, X.B.¹ Zeng, X.C.² Chu, P.K.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.