Operating characteristics of a 100 kV, 100 kW plasma ion implantation facility

Surface and Coatings Technology

Volumn 85, Issue 1-2, 1996, Pages 92-97

  Matossian, Jesse N ^a   Wei, Ronghua ^a  

^a Hughes Aircraft Co   (United States)

Author keywords

Plasma ion implantation; Surface modification

Indexed keywords

ELECTRIC CURRENTS; FACILITIES; FREQUENCIES; NITROGEN; PLASMA SHEATHS; PLASMA SOURCES; PLASMAS; SURFACE TREATMENT; WAVEFORM ANALYSIS;

CURRENT PULSE WAVEFORM; OPERATING CHARACTERISTICS; PLASMA ION IMPLANTATION; PLASMA PRODUCTION; PULSE DURATION;

ION IMPLANTATION;

EID: 0030296206     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(96)02872-1     Document Type: Article

References (11)

1. J. Conrad, J. Radtke, R. Dodd and F. Worzala, J. Appl. Phys. 62(11) (1987) 4591.
2. B.P. Wood, I. Henins, R.J. Gribble, W.A. Rease, R.J. Fehl, M.A. Nastasi and D.J. Rej, J. Vac. Sci. Technol. B, 12(2) (1994) 873.
3. J.N. Matossian, J. Vac. Sci. Technol. B, 12(2) (1994) 850.
4. J.N. Matossian and D.M. Goebel, Surf. Coat. Technol., this volume.
5. A.M. Anipolov, N.K. Berezhetskaya, V.A. Kop'ev, I.A. Kossyi and J.N. Matossian, paper presented at 22nd Int. Conf. on Phenomena in Ionized Gases, Stevens Institute of Technology, Hoboken, NJ, 31 July-4 August 1995.
6. A.A. Dorofeyuk, I.A. Kossyi, S.M. Ramiro, V.E. Terekhin and J.N. Matossian, paper presented at 10th Conf. on Gas Discharges and their Applications, Tokyo, 11-15 September 1995.
7. J.N. Matossian and D.M. Goebel, US Patent 5,218,179, 8 June 1993.
8. J.N. Matossian and D.M. Goebel, US Patent 5,296,272, 22 March 1994.
9. J.J. Vajo, J.D. Williams, R. Wei, R.G. Wilson and J.N. Matossian, J. Appl. Phys., 76(10) (1994) 5666-5675.
10. R.W. Schumacher, J.N. Matossian and D.M. Goebel, US Patent 5,330,800, 19 July 1994.
11. S.M. Malik, K. Sridhoron, R.P. Fetherston, A. Chen and J.R. Conrad, J. Vac. Sci. Technol. B, 12(2) (1994).