-
1
-
-
0035008072
-
"A sub-micron capacitive gap process for multiple-metal-electrode lateral micromechanical resonators"
-
Interlaken, Switzerland, Jan. 21-25
-
W. T. Hsu, J. R. Clark, and C. T.-C. Nguyen, "A sub-micron capacitive gap process for multiple-metal-electrode lateral micromechanical resonators," in Proc. IEEE Microelectromech Syst. MEMS, Interlaken, Switzerland, Jan. 21-25, 2001, pp. 349-352.
-
(2001)
Proc. IEEE Microelectromech. Syst. MEMS
, pp. 349-352
-
-
Hsu, W.T.1
Clark, J.R.2
Nguyen, C.T.-C.3
-
2
-
-
0038397228
-
"Micropackaging technologies for integrated microsystems: Applications to MEMS and MOEMS"
-
Jan. 27-29
-
K. Najafi, "Micropackaging technologies for integrated microsystems: applications to MEMS and MOEMS," in Proc. SPIE Micromachining and Microfabrication Process Technology VIII, vol. 4983, Jan. 27-29, 2003, pp. 1-19.
-
(2003)
Proc. SPIE Micromachining and Microfabrication Process Technology VIII
, vol.4983
, pp. 1-19
-
-
Najafi, K.1
-
3
-
-
1942436715
-
"A low-temperature thin-film electroplated metal vacuum package"
-
B. H. Stark and K. Najafi, "A low-temperature thin-film electroplated metal vacuum package," J. Microelectromech. Syst., vol. 13, pp. 147-157, 2004.
-
(2004)
J. Microelectromech. Syst.
, vol.13
, pp. 147-157
-
-
Stark, B.H.1
Najafi, K.2
-
4
-
-
0036929055
-
"Wafer level micropackaging of MEMS devices using thin film anodic bonding"
-
San Francisco, CA, Apr. 1-3
-
L. E. S. Rohwer, A. D. Oliver, and M. V. Collins, "Wafer level micropackaging of MEMS devices using thin film anodic bonding," in Proc. Materials Research Soc. Symp., vol.729, San Francisco, CA, Apr. 1-3, 2002, pp. 229-234.
-
(2002)
Proc. Materials Research Soc. Symp.
, vol.729
, pp. 229-234
-
-
Rohwer, L.E.S.1
Oliver, A.D.2
Collins, M.V.3
-
5
-
-
4644241119
-
"Self-aligned 0-level sealing of MEMS devices by a two layer thin film reflow process"
-
C. Rusu, H. Jansen, R. Gunn, and A. Witvrouw, "Self-aligned 0-level sealing of MEMS devices by a two layer thin film reflow process," Microsyst. Technol., vol. 10, pp. 364-371, 2004.
-
(2004)
Microsyst. Technol.
, vol.10
, pp. 364-371
-
-
Rusu, C.1
Jansen, H.2
Gunn, R.3
Witvrouw, A.4
-
7
-
-
78249255813
-
"An integrated wafer-scale packaging process for MEMS"
-
New Orleans, LA, Nov. 17-22
-
T. W. Kenny et al., "An integrated wafer-scale packaging process for MEMS," in Proc. ASME Int. Mechanical Engineering Congr. Expos., New Orleans, LA, Nov. 17-22, 2002, pp. 51-54.
-
(2002)
Proc. ASME Int. Mechanical Engineering Congr. Expos.
, pp. 51-54
-
-
Kenny, T.W.1
-
8
-
-
2342511565
-
"Selective low-temperature microcap packaging technique through flip chip and wafer level alignment"
-
C. T. Pan, "Selective low-temperature microcap packaging technique through flip chip and wafer level alignment," J. Micromech. Microeng., vol. 14, pp. 522-529, 2004.
-
(2004)
J. Micromech. Microeng.
, vol.14
, pp. 522-529
-
-
Pan, C.T.1
-
9
-
-
7244226133
-
"A wafer-level microcap array to enable high-yield microsystem packaging"
-
Y. J. Chiang, M. Bachman, and G. P. Li, "A wafer-level microcap array to enable high-yield microsystem packaging," IEEE Trans. Adv. Packag., vol. 27, no. 3, pp. 490-496, 2004.
-
(2004)
IEEE Trans. Adv. Packag.
, vol.27
, Issue.3
, pp. 490-496
-
-
Chiang, Y.J.1
Bachman, M.2
Li, G.P.3
-
10
-
-
1542642421
-
"A novel device-level micropackaging using micro assembly transfer"
-
New York, Nov. 11-16
-
J. Y. Chen, "A novel device-level micropackaging using micro assembly transfer," in Proc. ASME Int. Mechanical Engineering Congr Expo., New York, Nov. 11-16, 2001, pp. 769-774.
-
(2001)
Proc. ASME Int. Mechanical Engineering Congr. Expo.
, pp. 769-774
-
-
Chen, J.Y.1
-
12
-
-
0026139223
-
"Diffusion bonding. Process and applications"
-
S. B. Dunkerton, "Diffusion bonding. Process and applications," Weld Met. Fabr, vol. 59, no. 3, 1991.
-
(1991)
Weld Met. Fabr.
, vol.59
, Issue.3
-
-
Dunkerton, S.B.1
-
13
-
-
0037324238
-
"Phase formation and diffusion soldering in Pt/In, Pd/In, and Zr/Sn thin-film systems"
-
T. Studnitzky and R. Schmid-Fetzer, "Phase formation and diffusion soldering in Pt/In, Pd/In, and Zr/Sn thin-film systems," J. Electron. Mater, vol. 32, no. 2, 2003.
-
(2003)
J. Electron. Mater.
, vol.32
, Issue.2
-
-
Studnitzky, T.1
Schmid-Fetzer, R.2
-
14
-
-
0032642046
-
"Morphology and long term stability of Ni/Ni interconnections based on diffusion soldering"
-
P. K. Khanna, G. Dalke, and W. Gust, "Morphology and long term stability of Ni/Ni interconnections based on diffusion soldering," Mater Res. Adv. Tech., vol. 90, pp. 722-726, 1999.
-
(1999)
Mater. Res. Adv. Tech.
, vol.90
, pp. 722-726
-
-
Khanna, P.K.1
Dalke, G.2
Gust, W.3
-
15
-
-
84954992915
-
"Diffusion soldering"
-
D. M. Jacobson and G. Humpston, "Diffusion soldering," Solder Surf. Mt. Technol., vol. 10, no. 2, pp. 27-32, 1992.
-
(1992)
Solder Surf. Mt. Technol.
, vol.10
, Issue.2
, pp. 27-32
-
-
Jacobson, D.M.1
Humpston, G.2
-
16
-
-
51249170304
-
"Intermetallic phase formation in thin solid-liquid diffusion couples"
-
F. Bartels et al., "Intermetallic phase formation in thin solid-liquid diffusion couples," J. Electron. Mater, vol. 23, no. 8, pp. 787-790, 1994.
-
(1994)
J. Electron. Mater.
, vol.23
, Issue.8
, pp. 787-790
-
-
Bartels, F.1
-
17
-
-
28444469590
-
"Development of Cu/Cu interconnections using an indium interlayer"
-
Munich, Germany, Sep. 27-30
-
S. Sommadossi et al., "Development of Cu/Cu interconnections using an indium interlayer," in Proc. Conf. Eur. Mat., Munich, Germany, Sep. 27-30, 2000, pp. 14.
-
(2000)
Proc. Conf. Eur. Mat.
, pp. 14
-
-
Sommadossi, S.1
-
18
-
-
8344285501
-
"Diffusion soldering: A new low temperature process for joining carat gold jewelry"
-
G. Humpston, D. M. Jacobson, and S. P. S. Sangha, "Diffusion soldering: a new low temperature process for joining carat gold jewelry," Gold Bull., vol. 26, no. 3, pp. 90-104, 1993.
-
(1993)
Gold Bull.
, vol.26
, Issue.3
, pp. 90-104
-
-
Humpston, G.1
Jacobson, D.M.2
Sangha, S.P.S.3
-
19
-
-
0033898950
-
"Die bonding with Au/In isothermal solidification technique"
-
T. B. Wang et al., "Die bonding with Au/In isothermal solidification technique," J. Electron. Mater., vol. 29, no. 40, pp. 443-447, 2000.
-
(2000)
J. Electron. Mater.
, vol.29
, Issue.40
, pp. 443-447
-
-
Wang, T.B.1
-
20
-
-
2642517182
-
"Critical interlayer thickness for transient liquid phase bonding in the Cu-Sn system"
-
N. S. Bosco and F. W. Zok, "Critical interlayer thickness for transient liquid phase bonding in the Cu-Sn system," Acta Materialia, vol. 52, no. 10, pp. 2965-2972, 2004.
-
(2004)
Acta Materialia
, vol.52
, Issue.10
, pp. 2965-2972
-
-
Bosco, N.S.1
Zok, F.W.2
|