Formation of hydrogenated carbon nitride films by reactive sputtering

Journal of Applied Physics

Volumn 92, Issue 11, 2002, Pages 6525-6530

  Wei, J ^a  

^a SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; ELECTRON DIFFRACTION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAIN SIZE AND SHAPE; HELIUM NEON LASERS; MICROSTRUCTURE; RAMAN SPECTROSCOPY; SPUTTER DEPOSITION; SURFACE ROUGHNESS; SURFACE TOPOGRAPHY; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

DIRECT CURRENT REACTIVE SPUTTERING;

CARBON NITRIDE;

EID: 0036905367     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1518137     Document Type: Article

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