Growth and ordering of Si-Ge quantum dots on strain patterned substrates

Journal of Engineering Materials and Technology

Volumn 127, Issue 4, 2005, Pages 434-443

  Ramasubramaniam, A ^a   Shenoy, V B ^a  

^a Brown University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; GERMANIUM COMPOUNDS; GROWTH KINETICS; INTERFACIAL ENERGY; LITHOGRAPHY; MATHEMATICAL MODELS; NANOSTRUCTURED MATERIALS; NUCLEATION; SELF ASSEMBLY; SILICON COMPOUNDS; STRAIN;

COMPRESSIVE STRAIN; LOW MISMATCH; NANOLITHOGRAPHIC TECHNIQUES; STRAIN DISTRIBUTION;

SEMICONDUCTOR QUANTUM DOTS;

EID: 27744535995     PISSN: 00944289     EISSN: None     Source Type: Journal    
DOI: 10.1115/1.1924559     Document Type: Article

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