Optimization of anti-reflective coatings for lithography applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5835, Issue , 2005, Pages 263-272

  Bauer, J ^a   Fursenko, O ^a   Virko, S ^b   Kuck, B ^a   Grabolla, Th ^a   Melnik, V ^a   Mehr, W ^a  

^a IHP   (Germany)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SOFTWARE; DIFFRACTION; ELLIPSOMETRY; LITHOGRAPHY; OPTIMIZATION; X RAY PHOTOELECTRON SPECTROSCOPY;

ANTI-REFLECTIVE COATING (ARC); FILM COMPOSITION; LOW PRESSURE (LP);

REFLECTIVE COATINGS;

EID: 27744526857     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.637323     Document Type: Conference Paper

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