Physical-optical properties of LPCVD amorphous silicon rich-nitride and oxynitride

Proceedings of the International Semiconductor Conference, CAS

Volumn 1, Issue , 1998, Pages 201-204

  Modreanu, M ^a   Tomozeiu, N ^a   Cosmin, P ^a   Gartner, M ^a  

^a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; AMMONIA; AMORPHOUS FILMS; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITROGEN OXIDES; OXYGEN; REFRACTIVE INDEX; SILICA;

LOW-PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD); SILICON OXYNITRIDE; SPECTROELLIPSOMETRY; WEMPLE DI DOMENICO MODEL;

SILICON NITRIDE;

EID: 0032315455     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)