SiON large area deposition with a deep-UV flash argon/krypton lamp array

Applied Surface Science

Volumn 106, Issue , 1996, Pages 44-50

  Flicstein, J ^a   Mba, J ^a   Lescaut, B ^a   Vitel, Y ^b   Ossart, P ^a   Licoppe, C ^a  

^a ORANGE LABS   (France)

^b SORBONNE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; GAS LASERS; PERMITTIVITY; SILICON COMPOUNDS; STOICHIOMETRY; THERMAL EFFECTS;

FLASH DEEP ULTRAVIOLET CHEMICAL VAPOR DEPOSITION; SILICON OXYNITRIDE;

CHEMICAL VAPOR DEPOSITION;

EID: 0030566084     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00375-3     Document Type: Article

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