Fluence effect on ion-implanted As diffusion in relaxed SiGe

Europhysics Letters

Volumn 72, Issue 3, 2005, Pages 416-422

  Laitinen, P ^a,b   Raisanen J ^a,b   Riihimaki I ^c   Likonen, J ^d   Vainonen Ahlgren, E ^d  

^a UNIVERSITY OF HELSINKI   (Finland)

^b CERN   (Switzerland)

^c UNIVERSITY OF JYVÄSKYLÄ   (Finland)

^d VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 27744494028     PISSN: 02955075     EISSN: None     Source Type: Journal    
DOI: 10.1209/epl/i2005-10257-1     Document Type: Article

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