Characterization of defects in self-ion implanted Si using positron annihilation spectroscopy and Rutherford backscattering spectroscopy

Journal of Applied Physics

Volumn 79, Issue 12, 1996, Pages 9017-9021

  Fujinami, M ^a   Tsuge, A ^a   Tanaka, K ^a  

^a NIPPON STEEL CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001003327     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362634     Document Type: Article

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