Anomalous properties found in Cu films near below 100 nm thick deposited on Ta

Science and Technology of Advanced Materials

Volumn 6, Issue 6, 2005, Pages 620-627

  Tanimoto, Hisanori ^a   Fujiwara, Kenji ^a   Mizubayashi, Hiroshi ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

Cu thin film; Elastic property; Internal friction; Morphology; Surface oxidation; Ta buffer layer; Texture; Thermal stability

Indexed keywords

CRYSTALLOGRAPHY; RESIDUAL STRESSES; TANTALUM; TEXTURES;

CU FILM; SURFACE OXIDATION; TA BUFFER LAYERS;

COPPER;

EID: 27744480072     PISSN: 14686996     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.stam.2005.06.003     Document Type: Article

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