Plasma-Enhanced Chemical Vapor Deposition of Silicon Carbonitride Films from Volatile Silyl Derivatives of 1,1-Dimethylhydrazine

High Energy Chemistry

Volumn 37, Issue 5, 2003, Pages 303-309

  Smirnova, T P ^a   Badalyan, A M ^a   Borisov, V O ^a   Yakovkina, L V ^a   Kaichev, V V ^b   Shmakov, A N ^b   Nartova, A V ^b   Rakhlin, V I ^c   Fomina, A N ^c  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

^b BORESKOV INSTITUTE OF CATALYSIS   (Russian Federation)

^c A E FAVORSKY IRKUTSK INSTITUTE OF CHEMISTRY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

1,1 DIMETHYLHYDRAZINE; CARBON; SILANE DERIVATIVE; SILICON NITRIDE;

CHEMICAL BOND; CHEMICAL STRUCTURE; CONFERENCE PAPER; CRYSTALLIZATION; FILM; MATHEMATICAL COMPUTING; MORPHOLOGY; NANOPARTICLE; SURFACE PROPERTY; SYNTHESIS; VOLATILIZATION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0346655186     PISSN: 00181439     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1025700829352     Document Type: Conference Paper

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