X-ray lathe: An X-ray lithographic exposure tool for nonplanar objects

Journal of Microelectromechanical Systems

Volumn 5, Issue 4, 1996, Pages 250-255

  Feinerman, Alan D ^a,b,d,e,f,g   Lajos, Robert E ^b,h,i,j   White, Victor ^c,k,l   Denton, Denice D ^c,k,m  

^a IEEE

^b 1120 Science and Engineering Offices   (United States)

^c University of Wisconsin Madison   (United States)

^d Department of Obstetrics Gynecology   (United States)

^e NORTHWESTERN UNIVERSITY   (United States)

^f UIC Microfabrication Applic Lab

^g ELECTROCHEMICAL SOCIETY

^h DeVry Institute of Technology   (United States)

ⁱ UNIVERSITY OF ILLINOIS AT CHICAGO   (United States)

^j MOTOROLA INC   (United States)

^k UNIVERSITY OF WISCONSIN MADISON   (United States)

^l LUCENT TECHNOLOGIES   (United States)

^m MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

more..

Author keywords

[No Author keywords available]

Indexed keywords

CYLINDERS (SHAPES); EXPOSURE CONTROLS; LATHES; ROTATION; SURFACE PROPERTIES;

NONPLANAR OBJECTS; X RAY LATHE; X RAY LITHOGRAPHIC EXPOSURE;

X RAY LITHOGRAPHY;

EID: 0030382171     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.546405     Document Type: Article

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