Evaluation of alternative development process for high-aspect-ratio poly(methylmethacrylate) microstructures in deep X-ray lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3354-3359

  Khan Malek, Chantal ^a,b   Yajamanyam, Sasi ^b  

^a CNRS   (France)

^b LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALCOHOLS; ASPECT RATIO; KETONES; MICROSTRUCTURE; POLYMETHYL METHACRYLATES; WATER;

HARD X RAY DEEP LITHOGRAPHY;

X RAY LITHOGRAPHY;

EID: 0343431393     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1321759     Document Type: Article

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