Tapered microvalves fabricated by off-axis X-ray exposures

Microsystem Technologies

Volumn 4, Issue 4, 1998, Pages 201-204

  Tsuei, T W ^a   Wood, R L ^b   Khan Malek, C ^c   Donnelly, M M ^a   Fair, R B ^d  

^a IEP Group Inc   (United States)

^b MCNC   (United States)

^c LOUISIANA STATE UNIVERSITY   (United States)

^d DUKE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343433157     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s005420050131     Document Type: Article

References (5)

1. Guckel H; Christenson TR; Skrobis KJ; Denton DD; Choi B; Lovell EG; Lee JW; Bajikar SS; Chapman TW: (1990) Deep X-ray and UV lithographies for micromechanics. Tech. Dig., IEEE Solid State Sensor and Actuator Workshop. 118-122
2. Khan-Malek C; Wood R; Dudley B; Ling Z; Saile V: (1996) Multi-exposure capability development for deep X-ray lithography MEMS. SPIE Micromach. and Microfab. '96: Microlithog. and Metrology in Micromach. II.; 2880: 228-235
3. Mohr J; Ehrfeld W; Munchmeyer D: (1988) Requirements on resist layers in deep etch synchrotron radiation lithography. J. Vac. Sci. Technol. B6(6): 2264
4. Olsson A; Stemme G; Stemme E: (1996) Micromachined diffuser/nozzle elements for valve-less pumps. IEEE MEMS '96, 378-383
5. Tsuei TW; Donnelly MM: (1997) Patent pending