Process Simulation System for 3D X-Ray Lithography and Development

IEEJ Transactions on Sensors and Micromachines

Volumn 123, Issue 9, 2003, Pages 368-375

  Hirai, Yoshikazu ^a   Hafizovic, Sadik ^b   Korvink, Jan ^b   Tabata, Osamu ^a  

^a RITSUMEIKAN UNIVERSITY   (Japan)

^b UNIVERSITY OF FREIBURG   (Germany)

Author keywords

Deep X ray lithography; Fast Marching Method; PMMA dissolution rate; Simulation

Indexed keywords

EID: 85009579147     PISSN: 13418939     EISSN: 13475525     Source Type: Journal    
DOI: 10.1541/ieejsmas.123.368     Document Type: Article

References (9)

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