Concepts for creating ultra-deep trenches using deep X-ray lithography

Sensors and Actuators, A: Physical

Volumn 82, Issue 1, 2000, Pages 205-209

  Cheng, Y ^a   Shew, B Y ^a   Lin, C H ^a   Chyu, M K ^b  

^a NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^b CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CRYSTAL MICROSTRUCTURE; ELECTRONS; MASKS;

PHOTOELECTRONS;

X RAY LITHOGRAPHY;

EID: 0033732617     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(99)00333-7     Document Type: Article

References (9)

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