Optimized overlay metrology marks: Theory and experiment

IEEE Transactions on Semiconductor Manufacturing

Volumn 17, Issue 2, 2004, Pages 166-179

  Adel, Mike ^a   Ghinovker, Mark ^a   Golovanevsky, Boris ^a   Izikson, Pavel ^a   Kassel, Elyakim ^a   Yaffe, Dan ^a   Bruckstein, Alfred M ^b   Goldenberg, Roman ^b   Rubner, Yossi ^b   Rudzsky, Michael ^b  

^a KLA TENCOR CORPORATION   (United States)

^b TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

Box in box marks; Cramer Rao lower bound; Dynamic precision; Fisher information matrix; Grating marks; Overlay mark; Overlay mark fidelity; Overlay metrology

Indexed keywords

COMPUTER SIMULATION; ELECTRIC VARIABLES MEASUREMENT; ERROR ANALYSIS; MATRIX ALGEBRA; OPTIMIZATION; PHASE SHIFT;

BOX IN BOX MARKS; CRAMER RAO LOWER BOUND; DYNAMIC PRECISION; FISHER INFORMATION MATRIX; GRATING MARKS; OVERLAY MARK; OVERLAY MARK FIDELITY; OVERLAY METROLOGY;

LITHOGRAPHY;

EID: 2642519540     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2004.826955     Document Type: Conference Paper

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