Optimization of overlay markers to limit the measurement error induced during exposure by lens aberration effects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4689 I, Issue , 2002, Pages 374-385

  Luci, Alberto ^a   Ballarin, Eugenio G ^a  

^a MICRON TECHNOLOGY INC   (United States)

Author keywords

Aberrations; Alignment; Metrology; Overlay; Zernike

Indexed keywords

ABERRATIONS; ALIGNMENT; COMPUTER SIMULATION; LENSES; LIGHTING; MEASUREMENT ERRORS; OPTIMIZATION; PHOTOLITHOGRAPHY; POLYNOMIALS;

LENS ABERRATIONS; PHOTOLITHOGRAPHIC SIMULATIONS;

LAYERED MANUFACTURING;

EID: 0036031163     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.473476     Document Type: Conference Paper

References (0)