Complementary use of scatterometry and SEM for photoresist profile and CD determination

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4689, Issue , 2002, Pages 196-205

  Toyoshima, Yuya ^a   Kawata, Isao ^a   Usami, Yasutsugu ^a   Mitsui, Yasuhiro ^a   Sezginer, Apo ^b   Maiken, Eric ^b   Chan, Kin Chung ^b   Johnson, Ken ^b   Yonenaga, Dean ^b  

^a HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

^b Sensys Instruments Inc   (United States)

Author keywords

CD; Lithography; Scatterometry; SEM

Indexed keywords

ELECTRON BEAMS; LIGHT REFLECTION; QUALITY CONTROL; SCANNING ELECTRON MICROSCOPY;

CRITICAL DIMENSION (CD) METROLOGY; OPTICAL SCATTEROMETRY;

PHOTORESISTS;

EID: 0036029339     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473458     Document Type: Article

References (6)

1. R. Tamochi et al., Proc. 57th meeting, the Jpn. Soc. Electron Microsc. pp. 80, 2001.
2. Eric Maiken, K. Johnson, D. Likhachev, A. Norton, A. Sezginer, F. Stanke, D. Yonenaga, "Integrated Critical Dimension Metrology for Lithography Process Control", AEC/APC Symposium XIII, 2001.
3. M.G. Moharam, T.K. Gaylord, G.T. Sincerbox, H. Werlich, B. Yung, "Diffraction characteristics of photoresist surface-relief gratings,"Applied Optics 23(18), pp. 3214-3220, 1984.
4. Takashi Katouda, Tsugunori Okumura, Satoshi Komiya, Masashi Ozeki, Osamu Ueda, "Handoutai hyouka gijutu"(in Japanese), Sangyo Tosyo, Tokyo, pp. 104. 1999.
5. Torimi Minoru, 2000 Semiconductor Technology Outlook, pp. 207 (2000).
6. Atsuhiko Kato, Semiconductor FPD World, 8, pp. 166 (2001).