The control of growth parameters in the synthesis of high-quality single crystalline diamond by CVD

Journal of Crystal Growth

Volumn 284, Issue 3-4, 2005, Pages 396-405

  Achard, Jocelyn ^a   Tallaire, Alexandre ^a   Sussmann, Ricardo ^a,b   Silva, François ^a   Gicquel, Alix ^a  

^a UNIVERSITÉ PARIS 13   (France)

^b KING'S COLLEGE LONDON   (United Kingdom)

Author keywords

A1. Growth rate; A2. Chemical vapour deposition; A2. Homoepitaxial growth; B1. Diamond

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CONTAMINATION; DIFFRACTION; ELECTRIC REACTORS; NITROGEN; PHOTOLUMINESCENCE; RAMAN SPECTROSCOPY; SINGLE CRYSTALS; SURFACES; SYNTHESIS (CHEMICAL);

GROWTH RATES; HOMOEPITAXIAL GROWTH; METHANE CONCENTRATION;

DIAMONDS;

EID: 26044452049     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.07.046     Document Type: Article

References (33)

1. J. Isberg, J. Hammersberg, H. Bernhoff, D.J. Twitchen, and A.J. Whitehead Diam. Relat. Mater. 13 2004 872
2. J. Isberg, J. Hammersberg, D.J. Twitchen, and A.J. Whitehead Diam. Relat. Mater. 13 2004 320
3. J. Achard, F. Silva, H. Schneider, R.S. Sussmann, A. Tallaire, A. Gicquel, and M.C. Castex Diam. Relat. Mater. 13 2004 876
4. A. Tallaire, J. Achard, F. Silva, R.S. Sussmann, A. Gicquel, Diam. Relat. Mater. (2005), available on line.
5. J. Isberg, J. Hammersberg, E. Johansson, T. Wikstrom, D.J. Twitchen, A.J. Whitehead, S.E. Coe, and G.A. Scarsbrook Science 297 2002 1670
6. P.M. Martineau, S.C. Lawson, A.J. Taylor, S.J. Quinn, D.J.F. Evans, and M.J. Crowder Gems Gemol. 40 2004 2
7. A. Tallaire, J. Achard, F. Silva, R.S. Sussmann, A. Gicquel, and E. Rzepka Phys. Stat. Sol. A 201 2004 2419
8. N. Lee, and A. Badzian Diam. Relat. Mater. 6 1997 130
9. W.J.P. van Enckevort, G. Janssen, J.J. Schermer, and L.J. Giling Diam. Relat. Mater. 4 1995 250
10. G. Janssen, W.J.P. van Enckevort, W. Vollenberg, and L.J. Giling Diam. Relat. Mater. 1 1992 789
11. C. Findeling-Dufour, A. Vignes, and A. Gicquel Diam. Relat. Mater. 4 1995 429
12. A. Chayahara, Y. Mokuno, Y. Horino, Y. Takasu, H. Kato, H. Yoshikawa, and N. Fujimori Diam. Relat. Mater. 13 2004 1954
13. C.S. Yan, and Y.K. Vohra Diam. Relat. Mater. 8 1999 2022
14. C.J. Chu, R.H. Hauge, J.L. Margrave, and M.P. D'Evelyn Appl. Phys. Lett. 61 1992 1393
15. K. Hassouni, O. Leroy, S. Farhat, and A. Gicquel Plasma Chem. Plasma Process 18 1998 325
16. A. Gicquel, M. Chenevier, K. Hassouni, A. Tserepi, and M. Dubus J. Appl. Phys. 83 1998 7504
17. M.A. Cappelli, T.G. Owano, A. Gicquel, and X. Duten Plasma Chem. Plasma Process. 20 2000 1
18. G. Lombardi, K. Hassouni, G.D. Stancu, L. Mechold, J. Röpcke, A. Gicquel J. Appl. Phys., submitted for publication.
19. G. Lombardi, K. Hassouni, G.D. Stancu, L. Mechold, J. Röpcke, A. Gicquel, Plasma Sources Sci. Technol., submitted for publication.
20. T. Terraji, and T. Ito J. Crystal Growth 271 2004 409
21. A.M. Zaitsev Optical properties of diamond: a Data Handbook 2000 Springer Berlin
22. A. Tallaire, A. Collins, M. Newton, D. Charles, J. Achard, R.S. Sussmann, A. Gicquel, Diam. Relat. Mater., submitted for publication.
23. T. Teraji, S. Mitani, and T. Ito Phys. Stat. Sol. A 198 2003 395
24. W.J.P. van Enckevort, A.C.J.F. van der Berg, K.B.G. Kreuwel, A.J. Derksen, and M.S. Couto J. Crystal Growth 166 1996 156
25. F.K. de Theije, J.J. Schermer, and W.J.P. van Enckevort Diam. Relat. Mater. 9 2000 1439
26. P. Van der Putte, W.J.P. Van Enckevort, L.J. Giling, and J. Bloem J. Crystal Growth 43 1978 659
27. G. Lombardi, X. Duten, K. Hassouni, A. Rousseau, and A. Gicquel J. Electrochem. Soc. 150 5 2003 1
28. A. Gicquel, K. Hassouni, G. Lombardi, X. Duten, and A. Rousseau Mater. Res. 6 1 2003 25
29. A. Gicquel, F. Silva, X. Duten, K. Hassouni, G. Lombardi, A. Rousseau, Patent No. FR0300254, 2003.
30. W. Müller-Sebert, E. Wörner, F. Fuchs, C. Wild, and P. Koidl Appl. Phys. Lett. 68 1996 759
31. Y. Bar-Yam, and T.D. Moustakas Nature 342 1989 786
32. F.K. de Theije, J.J. Schermer, and W.J.P. van Enckevort Diam. Relat. Mater. 9 2000 1439
33. T. Frauenheim, G. Jungnickel, P. Sitchn, M. Kaulonen, F. Weich, J. Widanny, and D. Porezag Diam. Relat. Mater. 7 1998 348