Effects of pulsed microwave plasmas on diamond deposition

Journal of the Electrochemical Society

Volumn 150, Issue 5, 2003, Pages

  Lombardi, Guillaume ^a   Duten, Xavier ^a   Hassouni, Khaled ^a   Rousseau, Antoine ^b   Gicquel, Alix ^a  

^a UNIVERSITÉ PARIS 13   (France)

^b UNIVERSITÉ PARIS SUD   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (SPECIFIC GRAVITY); DOPPLER EFFECT; ELECTRON ENERGY LEVELS; FREE RADICALS; MATHEMATICAL MODELS; MICROWAVES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

ELECTRON ENERGY DISTRIBUTION FUNCTIONS; PULSED MICROWAVE PLASMAS; QUASI HOMOGENEOUS DISCHARGE MODEL; RADICAL DENSITIES;

DIAMOND FILMS;

EID: 0037840562     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1562934     Document Type: Article

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