Nitrogen induced increase of growth rate in chemical vapor deposition of diamond

Applied Physics Letters

Volumn 68, Issue 6, 1996, Pages 759-760

  Muller Sebert W ^a   Worner E ^a   Fuchs, F ^a   Wild, C ^a   Koidl, P ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED SOLID STATE PHYSICS IAF   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012605533     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116733     Document Type: Article

References (5)

1. R. Locher, C. Wild, N. Herres, D. Behr, and P. Koidl, Appl. Phys. Lett. 65, 34 (1994).
2. S. Jin and T. D. Moustakas, Appl. Phys. Lett. 65, 403 (1994).
3. J. E. Graebner and J. A. Herb, Diamond Films Technol. 1, 155 (1992).
4. E. Wörner, C. Wild, W. Mueller-Sebert, R. Locher, and P. Koidl, Diam. Relat. Mater. (to be published).
5. R. Samlenski, C. Haug, R. Brenn, C. Wild, R. Locher, and P. Koidl, Appl. Phys. Lett. 67, 2798 (1995).