A study of positive charge effect on AFM anodization lithography using metal phosphate monolayers

Ultramicroscopy

Volumn 91, Issue 1-4, 2002, Pages 165-169

  Kim, Sang Min ^a   Ahn, Sang Jung ^a   Lee, Haeseong ^a   Kim, Eung Ryul ^a   Lee, Haiwon ^a  

^a Hanyang University   (South Korea)

Author keywords

AFM lithography; Metal phosphate; Nanometer scale fabrication; Self assembled monolayer

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; LITHOGRAPHY; MONOLAYERS; PHOSPHORIC ACID;

NANOMETER-SCALE PATTERNING;

ANODIC OXIDATION;

CALCIUM ION; PHOSPHORIC ACID; ZIRCONIUM;

ADSORPTION; ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTRIC POTENTIAL; ELECTRON; ELLIPSOMETRY;

EID: 0036328189     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-3991(02)00096-7     Document Type: Article

References (16)