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Volumn 22, Issue 10, 2005, Pages 2700-2703
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Comparative characterization of InGaN/GaN multiple quantum wells by transmission electron microscopy, X-ray diffraction and rutherford backscattering
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Author keywords
[No Author keywords available]
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Indexed keywords
BACKSCATTERING;
GALLIUM ALLOYS;
HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;
III-V SEMICONDUCTORS;
INDIUM ALLOYS;
PERIODIC STRUCTURES;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SEMICONDUCTOR ALLOYS;
X RAY DIFFRACTION;
COMPARATIVE CHARACTERIZATIONS;
DEGREE OF RELAXATION;
ELASTIC-STRAINS;
IN COMPOSITIONS;
INGAN/GAN;
MULTI-LAYERED STRUCTURE;
PERIODIC THICKNESS;
RUTHERFORD BACKSCATTERING CHANNELING;
STRUCTURAL DEFECT;
X- RAY DIFFRACTIONS;
SEMICONDUCTOR QUANTUM WELLS;
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EID: 25644451205
PISSN: 0256307X
EISSN: None
Source Type: Journal
DOI: 10.1088/0256-307X/22/10/067 Document Type: Article |
Times cited : (7)
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References (18)
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