Integration of dual metal gate CMOS on high-k dielectrics utilizing a metal wet etch process

Electrochemical and Solid-State Letters

Volumn 8, Issue 10, 2005, Pages

  Zhang, Zhibo ^a   Song, S C ^a   Huffman, Craig ^a   Hussain, Muhammad M ^a   Barnett, Joel ^a   Moumen, Naim ^a   Alshareef, Husam N ^a   Majhi, Prashant ^a   Sim, Johnny H ^a   Bae, Sang Ho ^a   Lee, Byoung Hun ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; ELECTRODES; GATES (TRANSISTOR); SILICON WAFERS;

CMOS TRANSISTORS; GATE ELECTRODES; METAL GATE MATERIALS;

CMOS INTEGRATED CIRCUITS;

EID: 25644434391     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2030447     Document Type: Article

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