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Journal of Physical Chemistry B

Volumn 109, Issue 35, 2005, Pages 16988-16996

Photochemically patterned poly(methyl methacrylate) surfaces used in the fabrication of microanalytical devices

(5) Wei, Suying a Vaidya, Bikas a Patel, Ami B a Soper, Steven A a McCarley, Robin L a

a LOUISIANA STATE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROOSMOTIC FLOW (EOF); MICROANALYTICAL DEVICES; MICROFLUIDIC DEVICES;

ALCOHOLS; CARBOXYLIC ACIDS; ELECTROOSMOSIS; FABRICATION; FLUIDIC DEVICES; MOLECULAR WEIGHT; PHOTOCHEMICAL REACTIONS; PHOTOLYSIS; SURFACE ROUGHNESS; SURFACE TOPOGRAPHY; SURFACE TREATMENT; ULTRAVIOLET RADIATION;

POLYMETHYL METHACRYLATES;

CARBOXYLIC ACID; POLY(METHYL METHACRYLATE);

ARTICLE; CHEMICAL ANALYSIS; CHEMISTRY; FLUORESCENCE; INSTRUMENTATION; METHODOLOGY; PHOTOCHEMISTRY; SPECTROSCOPY; SURFACE PROPERTY; ULTRAVIOLET RADIATION; X RAY;

CARBOXYLIC ACIDS; CHEMISTRY TECHNIQUES, ANALYTICAL; CHEMISTRY, ANALYTICAL; FLUORESCENCE; PHOTOCHEMISTRY; POLYMETHYL METHACRYLATE; SPECTRUM ANALYSIS; SURFACE PROPERTIES; ULTRAVIOLET RAYS; X-RAYS;

EID: 25444446653 PISSN: 15206106 EISSN: None Source Type: Journal
DOI: 10.1021/jp051550s Document Type: Article

Times cited : (85)

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